Fame:A Fast Detailed Placement Algorithm for Standard\| Cell Layout Based on Mixed Mincut and Enumeration

作     者：姚波 侯文婷 洪先龙 蔡懿慈 YAO B0;HOU Wen-ting;HONG Xian-long;CAI Yi-ci

作者机构：清华大学计算机科学与技术系北京100084 

基　　金：Project Supported by National Natural Science Foundation of China( Grant No.697760 2 7) and by National973 Key Projectof China ( 

出 版 物：《Journal of Semiconductors》 (半导体学报（英文版）)

年 卷 期：2000年第21卷第8期

页      码：744-753页

摘      要：Rapid progress in manufacturing greatly challenges to the VLSI physical design in both speed and performance. A fast detailed placement algorithm, FAME is presented in this paper, according to these demands. It inherits the optimal positions of cells given by a global placer and exact position to each cell by local optimization. FM Mincut heuristic and local enumeration are used to optimize the total wirelength in y and x directions respectively, and a two way mixed optimizing flow is adopted to combine the two methods for a better performance. Furthermore, a better enumeration strategy is introduced to speed up the algorithm. An extension dealing with blockages in placement has also been discussed. Experimental results show that FAME runs 4 times faster than RITUAL and achieves a 5% short in total wirelength on average.

主 题 词：detailed placement layout VLSI mincut optimization 

学科分类：080903[080903] 0809[工学-计算机类] 08[工学] 

核心收录：

D　O　I：10.3321/j.issn:0253-4177.2000.08.004

馆 藏 号：203139923...