为IBA C70回旋加速器设计研制的采用Cusp场型H^-离子源与产生He束的ECR离子源的双束轴向注入系统(英文)

作     者：C.Bieth J.L.Delvaux F.Varenne M.Duval M.P.Bourgarel J.Fermé 

作者机构：PantechnikCaen14000France I.B.A.Louvain-La-Neuve1348Belgium GANILCaen14000France 

出 版 物：《Chinese Physics C》 (中国物理C（英文版）)

年 卷 期：2007年第31卷第S1期

页      码：223-225页

摘      要：At the moment,a 70MeV cyclotron is under construction by the IBA *** cyclotron will be able to accelerate H- beam from a multicusp source and with a beam intensity in the range of 10mA at the source extraction.A He1+2+ beam is also *** beam will be produced by a PANTECHNIK ECR ion source（SUPERNANOGAN）with an extracted current of 1 to *** this paper the studies and design of the two sources with a common axial injection in the cyclotron are described.

主 题 词：ECR beam H^- cyclotron 

学科分类：08[工学] 082701[082701] 0827[工学-食品科学与工程类] 

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