Design and fabrication of a novel high damage threshold HfO_2/TiO_2/SiO_2 multilayer laser mirror

作     者：孟增铀 黄莎玲 刘哲 曾承航 卜轶坤 

作者机构：Department of Electronic EngineeringXiamen University 

基　　金：supported by the National Natural Science Foundation of China (No.50802080) the Natural Science Foundation of Fujian Province of China (No.2010J01349) 

出 版 物：《Optoelectronics Letters》 (光电子快报（英文版）)

年 卷 期：2012年第8卷第3期

页      码：190-192页

摘      要：This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laser- induced damage threshold. The mirror is constructed by three materials of HfO/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO/SiO2 stacks act as the high reflector （HR） and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO/ TiO/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm^2 （1064 nm, 12 ns）. The possible laser damage mechanism of the mirror is discussed.

主 题 词：Bandwidth Dielectric materials Electric fields Hafnium oxides Reflection Titanium dioxide 

学科分类：08[工学] 0803[工学-仪器类] 

核心收录：

D　O　I：10.1007/s11801-012-1149-5

馆 藏 号：203380651...