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Design a Collector with More Reliability against Defects during Manufacturing in Nanometer Technology, QCA

Design a Collector with More Reliability against Defects during Manufacturing in Nanometer Technology, QCA

作     者:Milad Sang Sefidi Dariush Abedi Mehdi Moradian 

作者机构:Computer Engineering Department Sadjad University Mashhad Iran Computer Engineering Department Shahid Beheshti University Tehran Iran Electrical Engineering Faculty Sahand University of Technology Sahand Iran 

出 版 物:《Journal of Software Engineering and Applications》 (软件工程与应用(英文))

年 卷 期:2013年第6卷第6期

页      码:304-312页

摘      要:Nowadays Quantum Cellular Automata (QCA) as the leading technology in design of microelectronic systems has been raised. With respect to high velocity and density in low power and also simple concepts, this technology is a viable alternative to CMOS technology. In collector design, the primary component of each processor is very important. Due to the small elements in this technology, failure rate in manufacturing process technology is very high. In the other hand, the simulation shows that the intersection point of two wires is one of the critical points in QCA circuits. This means that defects in the manufacturing process around these points can cause malfunction in the circuit performance. In this paper, a collector in cross sections of wire in his new method used higher reliability against defects during manufacturing has been developed. QCA Designer software is used to simulate the case study system.

主 题 词:Collector Quantum Dot Cells Fault Tolerance Quantum Cellular Automata Nano-Scale Technologies 

学科分类:1002[医学-临床医学类] 100214[100214] 10[医学] 

D O I:10.4236/jsea.2013.66038

馆 藏 号:203459772...

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