Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design

作     者：安俊明 李健 郜定山 夏君磊 李建光 王红杰 胡雄伟 An Junming;Li Jian;Gao Dingshan;Xia Junlei;Li Jianguang;Wang Hongjie;Hu Xiongwei

作者机构：中国科学院半导体研究所光电子研究发展中心 

基　　金：国家重点基础研究发展规划 (批准号 :G2 0 0 0 0 3 660 2 ) 国家高技术研究发展计划(批准号 :2 0 0 2 AA3 12 2 60 ) 国家自然科学基金 (批准号 :6988970 1)资助项目 

出 版 物：《Journal of Semiconductors》 (半导体学报（英文版）)

年 卷 期：2004年第25卷第11期

页      码：1360-1363页

摘      要：A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is *** this method,a silicon layer is remained at the side of *** stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,*** results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.

主 题 词：silica on silicon arrayed waveguide grating stress birefringence polarization dependent wavelength numerical analysis 

学科分类：070207[070207] 07[理学] 0702[理学-物理学类] 

核心收录：

D　O　I：10.3969/j.issn.1674-4926.2004.11.003

馆 藏 号：203485413...