Design of a high flux VUV beamline for low energy photons

作     者：王佳佳 叶茂 石潭 常睿 乔山 

作者机构：Physics Department Laboratory of Advanced Materials and Surface Physics Laboratory (National Key Laboratory)Fudan University State Key Laboratory of Functional Materials for Informatics Institute of Microsystem and Information TechnologyChinese Academy of Sciences School of Physical Science and Technology Shanghai Tech University 

基　　金：Supported by National Natural Science Foundation of China(10979021,11027401,11174054,11304338,11227902) the Ministry of cience and Technology of China(2011CB921800) "Strategic Priority Research Program(B)"of Chinese Academy of Sciences(XDB04010100) 

出 版 物：《Chinese Physics C》 (中国物理C（英文版）)

年 卷 期：2015年第39卷第4期

页      码：91-96页

摘      要：A VUV beamline at the Shanghai Synchrotron Radiation Facility （SSRF） for angle-resolved photoelectron spectroscopy （ARPES） measurements is designed. To increase the resolution and bulk sensitivity, a photon energy as low as 7 eV is desired. Because the reflectivity for p-polarized photons strongly decreases when the photon energy is below 30 eV, the design of a high flux beamline for low energy VUV photons is a challenge. This work shows a variable including angle Varied Line-space Plane-Grating Monochromator （VLPGM） with varied grating depth （VGD） which can achieve both high resolution and high flux with broad energy coverage.

主 题 词：beamline VLS grating VGD grating 

学科分类：07[理学] 070202[070202] 0702[理学-物理学类] 

核心收录：

D　O　I：10.1088/1674-1137/39/4/048001

馆 藏 号：203618297...