看过本文的还看了

相关文献

该作者的其他文献

文献详情 >Design of LICVD equipment for prepa... 收藏
Design of LICVD equipment for preparation of nano powder and study on laser threshold

Design of LICVD equipment for preparation of nano powder and study on laser threshold

作     者:刘英才 尹衍升 李静 王贵 

作者机构:Institute of Material Science and Engineering Ocean University of China Qingdao 266003 Institute of Material Science and Engineering Ocean University of China Qingdao 266003 Key Lab for Liquid Structure and Heredity of Ministry of Education Engineering Ceramics Key Lab of Shandong Province Shandong University Ji'nan250061 Key Lab for Liquid Structure and Heredity of Ministry of Education Engineering Ceramics Key Lab of Shandong Province Shandong University Ji'nan 250061 

基  金:ThisworkwassupportedbytheNationalNaturalScicenceFoundationofChinaunderGrantNo.50242008 

出 版 物:《Chinese Optics Letters》 (中国光学快报(英文版))

年 卷 期:2004年第2卷第11期

页      码:643-646页

摘      要:A laser-induced chemical vapor deposition (LICVD) nanometer equipment is designed and fabricated. The design conception of key parts is expatiated. The energy threshold of SiH4 decomposing is studied. In the condition of same reactive gas flux, the laser energy threshold decreases with the increase of SiH4 concentration. In the condition of same SiH4 concentration, with the increase of reactive gas flux, the laser energy threshold which induces SiH4 decomposition increases linearly at the beginning, and when the flux is more than 100 ml/min, it turns to increase slowly. The factors which influence the laser threshold are analyzed.

主 题 词:Carbon dioxide lasers Laser applications Nanotechnology Silicon compounds 

学科分类:080903[080903] 0808[工学-自动化类] 0809[工学-计算机类] 08[工学] 080501[080501] 0805[工学-能源动力学] 080502[080502] 0702[理学-物理学类] 

核心收录:

馆 藏 号:203777760...

读者评论 与其他读者分享你的观点

用户名:未登录
我的评分