Design for manufacturability of a VDSM standard cell library

作     者：周宠 陈岚 曾健平 尹明会 赵劼 Zhou Chong;Chen Lan;Zeng Jianping;Yin Minghui;Zhao Jie

作者机构：College of Physics and Microelectronics ScienceHunan UniversityChangsha 410082China Institute of MicroelectronicsChinese Academy of SciencesBeijing 100029China 

基　　金：supported by the National Major Specialized Program of China(Nos.2008ZX01035-001-07 2009ZX02023-4-2) 

出 版 物：《Journal of Semiconductors》 (半导体学报（英文版）)

年 卷 期：2012年第33卷第2期

页      码：143-148页

摘      要：This paper presents a method of designing a 65 nm DFM standard cell *** reducing the amount of the library largely,the process of optical proximity correction（OPC） becomes more efficient and the need for large storage is *** library is more manufacture-friendly as each cell has been optimized according to the DFM rule and optical *** area penalty is minor compared with traditional library,and the timing,as well as power has a good ***,this library has passed the test from the Technology Design Department of *** result shows this DFM standard cell library has advantages that improve the yield.

主 题 词：design for manufacturability reduced standard cell library layout optimization optical simulation yield 

学科分类：080903[080903] 0808[工学-自动化类] 0809[工学-计算机类] 08[工学] 0805[工学-能源动力学] 0703[理学-化学类] 0702[理学-物理学类] 

核心收录：

D　O　I：10.1088/1674-4926/33/2/025015

馆 藏 号：203842140...