DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLY SHAPED ELECTRON BEAM LITHOGRAPHY

作     者：康念坎 江钧基 吴伟 黄兰友 吴明均 Kang Niankan Jiang Junji Wu Wei (Institute of Electronics,Academia Sinica,Beijing) Huang Lanyou Wu Mingjun (Scientific Instruments Factory,Academia Sinica,Beijing)

作者机构：Institute of ElectronicsAcademia SinicaBeijing Scientific Instruments FactoryAcademia SinicaBeijing 

出 版 物：《Journal of Electronics(China)》 (电子科学学刊（英文版）)

年 卷 期：1990年第7卷第4期

页      码：336-346页

摘      要：In order to obtain uniform exposure in variably shaped electron beam lithography,the beam current density and edge resolution on the target must not change for different spotshapes and *** key to the goal is the appropriate design of shaping deflectors.A linearand rotation compensation approach is *** of linear and rotation compensationfactors versus the distances between electron source image and centers of deflectors are measuredon an experimental electron beam column with variable spot *** experimental resultsare in good agreement with the calculated ones.

主 题 词：Electron beam lithography Electron Optics Shaping Deflector 

学科分类：070208[070208] 07[理学] 0702[理学-物理学类] 

D　O　I：10.1007/BF02892757

馆 藏 号：203872811...