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Design and implementation of 83-nm low noise InP-based InAlAs/InGaAs PHEMTs
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《Journal of Semiconductors》2015年 第8期36卷 83-87页
作者:王志明 赵卓彬 胡志富 黄辉 崔玉兴 孙希国 默江辉 李亮 付兴昌 吕昕Beijing Key Laboratory of Millimeter Wave and Terahertz Technology Beijing Institute of Technology Hebei Semiconductor Research Institute National Institute of Metrology 
83-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors (PHEMTs) with excellent DC and RF performance as well as low noise characteristics are reported, including...
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