T=题名(书名、题名),A=作者(责任者),K=主题词,P=出版物名称,PU=出版社名称,O=机构(作者单位、学位授予单位、专利申请人),L=中图分类号,C=学科分类号,U=全部字段,Y=年(出版发行年、学位年度、标准发布年)
AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
范例一:(K=图书馆学 OR K=情报学) AND A=范并思 AND Y=1982-2016
范例二:P=计算机应用与软件 AND (U=C++ OR U=Basic) NOT K=Visual AND Y=2011-2016
摘要:In semiconductor manufacturing process, probe station that is testing equipment is important. Inspection step is for detecting defects on semiconductor before the packaging. Probe card is a part of probe station and contains probe tip that contacts to semiconductor. Through probe tip, it can inspect defects of semiconductor. In this paper, optimization method is used with response surface analysis to design MEMS type probe tip. And fabricating probe tip uses maskless lithography, electro-plating and lapping process.
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