T=题名(书名、题名),A=作者(责任者),K=主题词,P=出版物名称,PU=出版社名称,O=机构(作者单位、学位授予单位、专利申请人),L=中图分类号,C=学科分类号,U=全部字段,Y=年(出版发行年、学位年度、标准发布年)
AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
范例一:(K=图书馆学 OR K=情报学) AND A=范并思 AND Y=1982-2016
范例二:P=计算机应用与软件 AND (U=C++ OR U=Basic) NOT K=Visual AND Y=2011-2016
摘要:Oxidative etching can be a powerful approach to modify the morphology of nanoscale materials for various *** of the etching mechanisms and morphological evolution during etching is *** the liquid cell transmission electron microscopy,we investigate the etching behavior of gold nanorods under different electron beam dose rates:caseⅠ,3.5×10^9 Gy s^-1;caseⅡ,1.5×10^10 Gy s^-1;caseⅢ,4.5×10^10 Gy s^-*** Au nanorod develops facets at the tips(caseⅠ)or adopts a transit ellipsoid shape and eventually dissolves(caseⅡ),depending on the dose *** rapid etching under an even higher dose rate(caseⅢ)may lead to the formation of Au3+ion-rich intermediates around the nanorod,which further accelerates the lateral etching and unexpectedly increases the aspect ratio of the *** quantitative analysis shows that the critical size of the nanorod,below which the etching rate increases significantly with the reduction of nanorod size,may vary subject to the degree that the system is away from *** results provide significant insights into the oxidative etching mechanisms and shed light on the rational design and synthesis of nanostructures.
地址:宁波市钱湖南路8号浙江万里学院(315100)
Tel:0574-88222222
招生:0574-88222065 88222066
Email:yzb@zwu.edu.cn