摘要：This paper presents a method of designing a 65 nm DFM standard cell *** reducing the amount of the library largely,the process of optical proximity correction（OPC） becomes more efficient and the need for large storage is *** library is more manufacture-friendly as each cell has been optimized according to the DFM rule and optical *** area penalty is minor compared with traditional library,and the timing,as well as power has a good ***,this library has passed the test from the Technology Design Department of *** result shows this DFM standard cell library has advantages that improve the yield.